Modeling Of Photoelastic Constant Dependent On Arbitrary Crystal Orientation

dc.contributor.author	Jahan Rashid Pinky, Lubna
dc.contributor.author	Naim Rakib Ahmed, Abu
dc.date.accessioned	2015-09-10T03:17:22Z
dc.date.available	2015-09-10T03:17:22Z
dc.date.issued	2011-02
dc.description.abstract	A mathematical model is proposed to determine the photoelastic constants in arbitrary crystal orientation of Zincblende crystal structure. Tensor rotation technique is applied using Euler’s rotation theorem to develop the model. The model is applicable to evaluate photoelastic constants in terms of P11-P12 and P44 in any crystal plane by controlling the rotation angle using the model. P11-P12 and P44 are calculated for Silicon crystal and found that the values of these constants are strongly dependent on crystal orientations. The outcome of this research enables us to evaluate quantitative amount of strain in polycrystalline silicon material (solar cell material) using Scanning Infrared Polariscope.	en_US
dc.description.sponsorship	R&D Wing	en_US
dc.identifier.issn	2073-6444
dc.identifier.uri	http://hdl.handle.net/123456789/209
dc.language.iso	en	en_US
dc.publisher	R&D Wing, MIST	en_US
dc.relation.ispartofseries	Galaxy (Dhaka) : The Annual Technical Journal of MIST;Volume 3, Number 3, February 2011
dc.subject	Photoelastic constant, polycrystalline silicon, tensor rotation, crystal orientation, scanning infrared Polariscope method.	en_US
dc.title	Modeling Of Photoelastic Constant Dependent On Arbitrary Crystal Orientation	en_US
dc.type	Article	en_US

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